JPH0566522B2 - - Google Patents
Info
- Publication number
- JPH0566522B2 JPH0566522B2 JP22771984A JP22771984A JPH0566522B2 JP H0566522 B2 JPH0566522 B2 JP H0566522B2 JP 22771984 A JP22771984 A JP 22771984A JP 22771984 A JP22771984 A JP 22771984A JP H0566522 B2 JPH0566522 B2 JP H0566522B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- depth
- diffracted light
- order
- diffraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22771984A JPS61107104A (ja) | 1984-10-31 | 1984-10-31 | 微細パタ−ン深さ測定方法及びその装置 |
US06/685,550 US4615620A (en) | 1983-12-26 | 1984-12-24 | Apparatus for measuring the depth of fine engraved patterns |
US07/254,964 USRE33424E (en) | 1983-12-26 | 1988-10-07 | Apparatus and method for measuring the depth of fine engraved patterns |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22771984A JPS61107104A (ja) | 1984-10-31 | 1984-10-31 | 微細パタ−ン深さ測定方法及びその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61107104A JPS61107104A (ja) | 1986-05-26 |
JPH0566522B2 true JPH0566522B2 (en]) | 1993-09-22 |
Family
ID=16865279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22771984A Granted JPS61107104A (ja) | 1983-12-26 | 1984-10-31 | 微細パタ−ン深さ測定方法及びその装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61107104A (en]) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63222208A (ja) * | 1987-03-11 | 1988-09-16 | Japan Spectroscopic Co | 凹部深さ測定装置 |
JPH0617774B2 (ja) * | 1987-06-22 | 1994-03-09 | 大日本スクリ−ン製造株式会社 | 微小高低差測定装置 |
JPH0781836B2 (ja) * | 1987-12-01 | 1995-09-06 | キヤノン株式会社 | 光学測定装置 |
JP2544447B2 (ja) * | 1988-08-12 | 1996-10-16 | 株式会社日立製作所 | 深さ測定方法および装置 |
EP3041996A1 (en) | 2013-09-02 | 2016-07-13 | Nausicaa Tilde Sartori | Unmanned mobile device and relative method for treating a snow covered surface, and in particular of glaciers |
-
1984
- 1984-10-31 JP JP22771984A patent/JPS61107104A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61107104A (ja) | 1986-05-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4615620A (en) | Apparatus for measuring the depth of fine engraved patterns | |
US7586623B2 (en) | Optical metrology of single features | |
US6724475B2 (en) | Apparatus for rapidly measuring angle-dependent diffraction effects on finely patterned surfaces | |
KR101790830B1 (ko) | 간섭계, 리소그래피 장치, 및 물품 제조 방법 | |
KR20040071146A (ko) | 반도체 웨이퍼의 응력 측정 방법 및 장치 | |
US20130077100A1 (en) | Surface shape measurement method and surface shape measurement apparatus | |
JP2022541364A (ja) | スペクトル共焦点測定装置及び測定方法 | |
JPH03183904A (ja) | 物体の形状の検知 | |
KR20190132243A (ko) | 광학 측정 장치 및 광학 측정 방법 | |
US6900900B2 (en) | Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements | |
JP4823289B2 (ja) | 反射式散乱計 | |
JPH0566522B2 (en]) | ||
JP3336358B2 (ja) | フォトマスク検査装置及び方法並びに位相変化量測定装置 | |
JP3139020B2 (ja) | フォトマスク検査装置およびフォトマスク検査方法 | |
JPS63193003A (ja) | 凹部深さ・膜厚測定装置 | |
USRE33424E (en) | Apparatus and method for measuring the depth of fine engraved patterns | |
US20040196460A1 (en) | Scatterometric measuring arrangement and measuring method | |
US20040145744A1 (en) | Measuring array | |
JP3219223B2 (ja) | 特性値測定方法及び装置 | |
JPS58727A (ja) | フ−リエ変換分光装置 | |
CN117871044B (zh) | 一种测定Littrow衍射角的装置及方法 | |
CN116819884B (zh) | 掩模倾斜角度测量装置及曝光设备 | |
JPH07113548B2 (ja) | 表面変位検出装置 | |
JPH044167Y2 (en]) | ||
JPH04229864A (ja) | フォトマスク検査装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |